Effect of DI-Water dilution and etchant arm movement on spinning type wet etch

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations
Original languageEnglish
Title of host publicationUltra Clean Processing of Semiconductor Surfaces XII
EditorsPaul W. Mertens, Marc Meuris, Marc Heyns, Marc Meuris, Marc Heyns
PublisherTrans Tech Publications Ltd
Pages125-127
Number of pages3
ISBN (Electronic)9783038352426
DOIs
StatePublished - 2015
Externally publishedYes
Event12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2014 - Brussels, Belgium
Duration: 21 Sep 201424 Sep 2014

Publication series

NameSolid State Phenomena
Volume219
ISSN (Print)1012-0394
ISSN (Electronic)1662-9779

Conference

Conference12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2014
Country/TerritoryBelgium
CityBrussels
Period21/09/1424/09/14

Keywords

  • DI-water dilution
  • Etch amount
  • Etchant arm movement
  • Uniformity

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