Abstract
The effect of multivalent metal cations, including vanadium(V) and tin (Sn), on the electrical properties of vanadium-doped zinc tin oxide (VZTO) was investigated in the context of the fabrication of thin-film transistors (TFTs) using a single VZTO film and VZTO/ZTO bilayer as channel layers. The single VZTO TFT did not show any response to the gate voltage (insulator-like behavior). On the other hand, the VZTO/ZTO bilayer TFT exhibited a typical TFT transfer characteristic (semiconducting behavior). X-ray photoelectron spectroscopy revealed that, in contrast to what is commonly true in many oxides, oxygen vacancies (VO) in VZTO did not provide a dominant contribution to the total carrier concentration, because the VO peak area in the single VZTO film was 5.4% and reduced to 4.5% in VZTO/ZTO bilayer. Instead, Sn 3d5/2 and V 2p3/2 spectra suggest that the significant reduction in Sn and V ions is strongly related to the insulator-like behavior of the VZTO film. In negative-bias illumination tests and illumination tests with various photon energies, the VZTO/ZTO bilayer TFT had much better stability than the ZTO TFT. This result is attributed to the reduction of donor-like states (VO) that can be positively ionized by blue and green illumination.
| Original language | English |
|---|---|
| Pages (from-to) | 6118-6124 |
| Number of pages | 7 |
| Journal | ACS Applied Materials and Interfaces |
| Volume | 7 |
| Issue number | 11 |
| DOIs | |
| State | Published - 25 Mar 2015 |
Keywords
- dual electrical property
- multivalent metal cation
- oxide semiconductor
- stability
- thin film transistor