Double layer SiNx:H films for passivation and anti-reflection coating of c-Si solar cells

Jisoo Ko, Daeyeong Gong, Krishnakumar Pillai, Kong Soo Lee, Minkyu Ju, Pyungho Choi, Kwang Ryul Kim, Junsin Yi, Byoungdeog Choi

Research output: Contribution to journalArticlepeer-review

34 Scopus citations

Abstract

In this report, we present a cost effective simple innovative approach to fabricate double layer anti-reflection (DLAR) coatings using a single material which can provide high qualities of passivation and anti-reflection property. Two layers of SiNx:H films with different refractive indices were deposited onto p-type c-Si wafer using plasma enhanced chemical vapor deposition reactor by controlling the NH3 and SiH4 gas ratio. Refractive indices of top and bottom layers were chosen as 1.9 and 2.3 respectively. The effect of passivation at the interface was investigated by effective carrier lifetime, hydrogen concentration and interface trapped density (Dit) measurements. The optical characteristic was analyzed by reflectance and transmittance measurements. A superior efficiency of 17.61% was obtained for solar cells fabricated with DLAR coating when compared to an efficiency of 17.24% for cells with SLAR coating. Further, Jsc and Voc of solar cell with DLAR coating is increased by a value of ~ 1 mA/cm2 and 4 mV respectively than cell with SLAR coating.

Original languageEnglish
Pages (from-to)6887-6891
Number of pages5
JournalThin Solid Films
Volume519
Issue number20
DOIs
StatePublished - 1 Aug 2011

Keywords

  • Anti-reflection coating (ARC)
  • Passivation
  • PECVD
  • Silicon nitride
  • Solar cell

Fingerprint

Dive into the research topics of 'Double layer SiNx:H films for passivation and anti-reflection coating of c-Si solar cells'. Together they form a unique fingerprint.

Cite this