Doping of Al-catalyzed vapor-liquid-solid grown Si nanowires

  • Sung Jin Whang
  • , Sung Joo Lee
  • , Wei Feng Yang
  • , Hai Chen Zhu
  • , Han Lu Gu
  • , Byung Jin Cho
  • , Yun Fook Liew

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

We successfully synthesized high quality single crystal Si nanowires using Al catalyst via vapor-liquid-solid (VLS) mechanism, having diameters ranging from 10 to 200 nm with 10-20 (Jin of length. Characterization of physical and chemical properties of Al-catalyzed Si nanowires using transmission electron microscope (TEM), scanning electron microscope (SEM), X-ray photoelectron spectroscopy (XPS) analysis showed that single crystal Si nanowires can be grown with Al-catalyst at 540 °C and selective etching of Al existing at the tip of nanowire can provide metal-free Si nanowires that are compatible with conventional Si-based IC process. By using plasma doping method, it was confirmed that the doping level can be controlled and the boron was successfully introduced on Si substrate with 3x1022/cm3 of peak doping concentration.

Original languageEnglish
Title of host publicationMaterials Research Society Symposium Proceedings - Applications of Nanotubes and Nanowires
Pages66-71
Number of pages6
StatePublished - 2007
Externally publishedYes
EventApplications of Nanotubes and Nanowires - 2007 MRS Spring Meeting - San Francisco, CA, United States
Duration: 9 Apr 200713 Apr 2007

Publication series

NameMaterials Research Society Symposium Proceedings
Volume1018
ISSN (Print)0272-9172

Conference

ConferenceApplications of Nanotubes and Nanowires - 2007 MRS Spring Meeting
Country/TerritoryUnited States
CitySan Francisco, CA
Period9/04/0713/04/07

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