Development of nickel oxide thin film by chemical route for supercapacitor application

Aarti D. Narang, Satish P. Gupta, Poonam P. Sanap, Suman S. Kahandal, Rameshwar S. Tupke, Hansol Kim, Qian Wang, Amol S. Vedpathak, Shrikrishna D. Sartale, Vikas K. Gade, Pradip B. Shelke, Anuradha C. Pawar, Ji Man Kim, Ravindra N. Bulakhe

Research output: Contribution to journalArticlepeer-review

10 Scopus citations

Abstract

Inflation in energy needs, a concept that reflects the growing demand for energy resources, is often accompanied by an increase in their prices over time. As economies expand, populations grow, and industrial activities intensify, the requirement for energy rises significantly. To address such challenges, policymakers and energy stakeholders are continually exploring and investing in innovative solutions. The development of supercapacitive materials represents a significant stride in addressing energy needs, particularly in the context of energy storage and sustainable energy utilization. Consistent research in this field is necessary to unleash the full potential of materials for supercapacitive behavior. In the current work, nanostructured NiO thin films were developed for supercapacitor application. These films were deposited on a steel substrate (SS304) using a cost-effective and facile Chemical Bath Deposition method. The synthesized material was confirmed by XRD and FTIR analysis. The capacitance value of the obtained NiO film was 654.85 F/g at a current density of 1 A/g. This work also focused on enhancing the performance of nanostructured NiO cathode in an asymmetric hybrid supercapacitor.

Original languageEnglish
Article number1335
JournalJournal of Materials Science: Materials in Electronics
Volume35
Issue number19
DOIs
StatePublished - Jul 2024

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