Abstract
4,4′-Bis[N-(1-naphthyl)-N-phenylamino]biphenyl (α-NPD) was deposited in situ on both ruthenium oxide-coated indium-tin oxide (RuO x-ITC)) and O2-plasma-treated ITO (O2-ITO) anodes, and their interface dipole energies were quantitatively determined using synchrotron radiation photoemission spectroscopy. The dipole energy of RuO x-ITO was lower by 0.2 eV than that of O2-ITO even though RuOx-ITO had a higher work function. Secondary electron emission spectra after deposition of α-NPD on anodes revealed that the work function of RuOx-ITO is higher by 0.2 eV than that of O 2-ITO, resulting in a decrease of the turn-on voltage via reduction of hole injection barrier.
| Original language | English |
|---|---|
| Pages (from-to) | H79-H81 |
| Journal | Electrochemical and Solid-State Letters |
| Volume | 8 |
| Issue number | 9 |
| DOIs | |
| State | Published - 2005 |
| Externally published | Yes |