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Cyclic etching of silicon oxide using NF3/H2 remote plasma and NH3 gas flow

  • You Jung Gill
  • , Doo San Kim
  • , Hong Seong Gil
  • , Ki Hyun Kim
  • , Yun Jong Jang
  • , Ye Eun Kim
  • , Geun Young Yeom

Research output: Contribution to journal › Article › peer-review

11   Link opens in a new tab Scopus citations

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Chemical Engineering