Corrosion behavior of TiN, TiAlN, TiAlSiN thin films deposited on tool steel in the 3.5 wt.% NaCl solution

Yun Ha Yoo; Diem Phuong Le; Jung Gu Kim; Sun Kyu Kim; Pham Van Vinh

doi:10.1016/j.tsf.2007.08.069

Corrosion behavior of TiN, TiAlN, TiAlSiN thin films deposited on tool steel in the 3.5 wt.% NaCl solution

Yun Ha Yoo, Diem Phuong Le, Jung Gu Kim, Sun Kyu Kim, Pham Van Vinh

Department of Advanced Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

133 Scopus citations

Abstract

TiN, TiAlN and TiAlSiN hard coatings were deposited onto AISI H13 tool steel by cathodic arc plasma method. X-ray diffraction (XRD) analysis confirmed that incorporation of Al and Si into TiN led to refinement of microstructure. From the results of potentiodynamic polarization test and electrochemical impedance spectroscopy (EIS) test conducted in an aerated 3.5% NaCl solution, the TiAlSiN film showed the best corrosion resistance with the lowest corrosion current density and porosity, the highest protective efficiency and total resistance (pore resistance plus charge transfer resistance).

Original language	English
Pages (from-to)	3544-3548
Number of pages	5
Journal	Thin Solid Films
Volume	516
Issue number	11
DOIs	https://doi.org/10.1016/j.tsf.2007.08.069
State	Published - 1 Apr 2008

Keywords

Cathodic arc plasma deposition
Electrochemical impedance spectroscopy
Potentiodynamic test
TiN-based superhard coating

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10.1016/j.tsf.2007.08.069

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title = "Corrosion behavior of TiN, TiAlN, TiAlSiN thin films deposited on tool steel in the 3.5 wt.\% NaCl solution",

abstract = "TiN, TiAlN and TiAlSiN hard coatings were deposited onto AISI H13 tool steel by cathodic arc plasma method. X-ray diffraction (XRD) analysis confirmed that incorporation of Al and Si into TiN led to refinement of microstructure. From the results of potentiodynamic polarization test and electrochemical impedance spectroscopy (EIS) test conducted in an aerated 3.5\% NaCl solution, the TiAlSiN film showed the best corrosion resistance with the lowest corrosion current density and porosity, the highest protective efficiency and total resistance (pore resistance plus charge transfer resistance).",

keywords = "Cathodic arc plasma deposition, Electrochemical impedance spectroscopy, Potentiodynamic test, TiN-based superhard coating",

author = "Yoo, \{Yun Ha\} and Le, \{Diem Phuong\} and Kim, \{Jung Gu\} and Kim, \{Sun Kyu\} and Vinh, \{Pham Van\}",

year = "2008",

month = apr,

day = "1",

doi = "10.1016/j.tsf.2007.08.069",

language = "English",

volume = "516",

pages = "3544--3548",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier B.V.",

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TY - JOUR

T1 - Corrosion behavior of TiN, TiAlN, TiAlSiN thin films deposited on tool steel in the 3.5 wt.% NaCl solution

AU - Yoo, Yun Ha

AU - Le, Diem Phuong

AU - Kim, Jung Gu

AU - Kim, Sun Kyu

AU - Vinh, Pham Van

PY - 2008/4/1

Y1 - 2008/4/1

N2 - TiN, TiAlN and TiAlSiN hard coatings were deposited onto AISI H13 tool steel by cathodic arc plasma method. X-ray diffraction (XRD) analysis confirmed that incorporation of Al and Si into TiN led to refinement of microstructure. From the results of potentiodynamic polarization test and electrochemical impedance spectroscopy (EIS) test conducted in an aerated 3.5% NaCl solution, the TiAlSiN film showed the best corrosion resistance with the lowest corrosion current density and porosity, the highest protective efficiency and total resistance (pore resistance plus charge transfer resistance).

AB - TiN, TiAlN and TiAlSiN hard coatings were deposited onto AISI H13 tool steel by cathodic arc plasma method. X-ray diffraction (XRD) analysis confirmed that incorporation of Al and Si into TiN led to refinement of microstructure. From the results of potentiodynamic polarization test and electrochemical impedance spectroscopy (EIS) test conducted in an aerated 3.5% NaCl solution, the TiAlSiN film showed the best corrosion resistance with the lowest corrosion current density and porosity, the highest protective efficiency and total resistance (pore resistance plus charge transfer resistance).

KW - Cathodic arc plasma deposition

KW - Electrochemical impedance spectroscopy

KW - Potentiodynamic test

KW - TiN-based superhard coating

UR - https://www.scopus.com/pages/publications/40649114510

U2 - 10.1016/j.tsf.2007.08.069

DO - 10.1016/j.tsf.2007.08.069

M3 - Article

AN - SCOPUS:40649114510

SN - 0040-6090

VL - 516

SP - 3544

EP - 3548

JO - Thin Solid Films

JF - Thin Solid Films

IS - 11

ER -

Corrosion behavior of TiN, TiAlN, TiAlSiN thin films deposited on tool steel in the 3.5 wt.% NaCl solution

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Keywords

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