Conduction processes in a-Si:H and poly-Si films

  • J. Yi
  • , S. S. Kim
  • , D. G. Lim

Research output: Contribution to journalArticlepeer-review

5 Scopus citations

Abstract

This paper describes the conduction mechanism of the thin film Si for the application of solar cells. Some of the theoretical and experimental conduction processes of the a-Si:H and poly-Si are presented. The Schottky contact was formed by depositing semi-transparent metals on top of the silicon films. Dark current-voltage (I-V), illuminated I-V, current-voltage-temperature (I-V-T), and capacitance-voltage (C-V) measurements have been performed using the Schottky diode (Pd/Si/Mo) structure before and after anneal treatment. We observed that SCLC dominated for the intrinsic aSi:H and poly-Si. The Frenkel-Poole conduction mechanism fits well for the as-grown n-type a-Si:H. The doped poly-Si exhibited tunneling field emission to dominate the conduction process.

Original languageEnglish
Pages (from-to)S245-S250
JournalJournal of the Korean Physical Society
Volume30
Issue numberSUPPL. PART 1
StatePublished - 1997

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