Abstract
The crystallization and phase transformations of amorphous NiTi thin films were studied using in situ transmission electron microscopy (TEM). These films were sputter-deposited onto micromachined silicon-nitride membranes and subjected to heating and cooling conditions. The microstructural evolution was monitored and recorded. Kinetic parameters such as the nucleation rate, growth rate, and area-fraction transformed were independently determined by noting the number of grains per frame and their change in size. Using the Johnson-Mehl-Avrami-Kolmogorov analysis, fitted kinetic parameters were determined and found to be consistent with TEM observations. To explore the compositional sensitivity of crystallization, samples near-equiatomic and slightly Ti-rich were studied with these methods. TEM micrographs show that equiatomic films exhibit polymorphic crystallization while samples that are slightly off-stoichiometry showed more complicated behavior.
| Original language | English |
|---|---|
| Pages (from-to) | 1728-1734 |
| Number of pages | 7 |
| Journal | Journal of Materials Research |
| Volume | 20 |
| Issue number | 7 |
| DOIs | |
| State | Published - Jul 2005 |
| Externally published | Yes |