Communication - A Novel Method to Improve Cleaning Performance by Removing Small Particles in CMP Slurry

Jaewon Lee; Sang Hyeon Park; Seokjun Hong; Hyeonmin Seo; Pengzhan Liu; Eungchul Kim; Taesung Kim

doi:10.1149/2162-8777/abe1d6

Communication - A Novel Method to Improve Cleaning Performance by Removing Small Particles in CMP Slurry

Jaewon Lee
, Sang Hyeon Park
, Seokjun Hong
, Hyeonmin Seo
, Pengzhan Liu
, Eungchul Kim
, Taesung Kim

Department of Mechanical Engineering

Sungkyunkwan University

Research output: Contribution to journal › Article › peer-review

5 Scopus citations

Abstract

In the present study, a separation system with a tangential flow filter (TFF) was applied to reduce the number of small ceria particles in chemical mechanical polishing slurry. The small ceria particles were reduced by 30.7% via the TFF system, and slurry properties of particle mean diameter, pH, zeta potential, and solids concentration were maintained. There was no significant difference in removal rate between original and TFF-treated slurry. In addition, the cleaning efficiency with the TFF system was improved by 34.7% compared to that without the TFF system.

Original language	English
Article number	024001
Journal	ECS Journal of Solid State Science and Technology
Volume	10
Issue number	2
DOIs	https://doi.org/10.1149/2162-8777/abe1d6
State	Published - Feb 2021

Access to Document

10.1149/2162-8777/abe1d6

Cite this

@article{5313bb0f2b8347ca9aa877d215a56a41,

title = "Communication - A Novel Method to Improve Cleaning Performance by Removing Small Particles in CMP Slurry",

abstract = "In the present study, a separation system with a tangential flow filter (TFF) was applied to reduce the number of small ceria particles in chemical mechanical polishing slurry. The small ceria particles were reduced by 30.7\% via the TFF system, and slurry properties of particle mean diameter, pH, zeta potential, and solids concentration were maintained. There was no significant difference in removal rate between original and TFF-treated slurry. In addition, the cleaning efficiency with the TFF system was improved by 34.7\% compared to that without the TFF system.",

author = "Jaewon Lee and Park, \{Sang Hyeon\} and Seokjun Hong and Hyeonmin Seo and Pengzhan Liu and Eungchul Kim and Taesung Kim",

note = "Publisher Copyright: {\textcopyright} 2021 The Electrochemical Society ({"}ECS{"}). Published on behalf of ECS by IOP Publishing Limited.",

year = "2021",

month = feb,

doi = "10.1149/2162-8777/abe1d6",

language = "English",

volume = "10",

journal = "ECS Journal of Solid State Science and Technology",

issn = "2162-8769",

publisher = "Electrochemical Society Inc.",

number = "2",

}

TY - JOUR

T1 - Communication - A Novel Method to Improve Cleaning Performance by Removing Small Particles in CMP Slurry

AU - Lee, Jaewon

AU - Park, Sang Hyeon

AU - Hong, Seokjun

AU - Seo, Hyeonmin

AU - Liu, Pengzhan

AU - Kim, Eungchul

AU - Kim, Taesung

PY - 2021/2

Y1 - 2021/2

N2 - In the present study, a separation system with a tangential flow filter (TFF) was applied to reduce the number of small ceria particles in chemical mechanical polishing slurry. The small ceria particles were reduced by 30.7% via the TFF system, and slurry properties of particle mean diameter, pH, zeta potential, and solids concentration were maintained. There was no significant difference in removal rate between original and TFF-treated slurry. In addition, the cleaning efficiency with the TFF system was improved by 34.7% compared to that without the TFF system.

AB - In the present study, a separation system with a tangential flow filter (TFF) was applied to reduce the number of small ceria particles in chemical mechanical polishing slurry. The small ceria particles were reduced by 30.7% via the TFF system, and slurry properties of particle mean diameter, pH, zeta potential, and solids concentration were maintained. There was no significant difference in removal rate between original and TFF-treated slurry. In addition, the cleaning efficiency with the TFF system was improved by 34.7% compared to that without the TFF system.

UR - https://www.scopus.com/pages/publications/85101577664

U2 - 10.1149/2162-8777/abe1d6

DO - 10.1149/2162-8777/abe1d6

M3 - Article

AN - SCOPUS:85101577664

SN - 2162-8769

VL - 10

JO - ECS Journal of Solid State Science and Technology

JF - ECS Journal of Solid State Science and Technology

IS - 2

M1 - 024001

ER -

Communication - A Novel Method to Improve Cleaning Performance by Removing Small Particles in CMP Slurry

Abstract

Access to Document

Other files and links

Fingerprint

Cite this