Abstract
A small amount of NiO was deposited on mesoporous Al2O3 using atomic layer deposition and was subsequently annealed at different temperatures. We show that all of the samples prepared here show substantially high catalytic activity for CO oxidation near room temperature. Furthermore, as the pre-annealing temperature increased, an enhanced resistance toward poisoning during CO oxidation was observed. Particularly, the samples pre-annealed at 525 and 600°C showed almost no change in the CO oxidation reactivity for 12h at 30°C, and they are structurally stable at the temperature higher than 500°C.
| Original language | English |
|---|---|
| Pages (from-to) | 992-998 |
| Number of pages | 7 |
| Journal | Chemical Engineering Journal |
| Volume | 283 |
| DOIs | |
| State | Published - 1 Jan 2016 |
Keywords
- Atomic layer deposition
- CO oxidation
- Mesoporous AlO
- Nanoparticle
- NiO
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