Characterization of vacuum evaporated in - Se thin films

The InSe films of different thicknesses (290-730 nm) were deposited onto glass substrates under a pressure of 3×10^-5 Torr by vacuum evaporation method. The composition (In = 53.50%, Se = 46.50%) of this film was confirmed using Auger Electron Spectroscopy (AES). Thicknesses of the deposited films have been measured using a Multiple Beam Interferometry. The amorphous nature of the film is confirmed with X-ray diffractogram. From the transmittance spectra in the range of 500 nm-1200 nm, it is observed that the film showed direct allowed transition. Effect of thickness on the optical parameters such as the fundamental band gap, absorption constant, refractive index of InSe thin films are reported. Under low electric field (∼ 1.5×10⁵ Vcm^-1), the results of DC conductivity measurements revealed that the variable range hopping is the dominant conduction mechanism. The values of localized states density, localization radius and hopping energy of this film are estimated as 5.57×10 ²⁰ cm^-3V^-1, 0.84 Å and 0.247 eV, respectively.