Characterization of TiOxNy films grown by PECVD method: Structural and optical properties

C. K. Jung; I. S. Bae; Y. H. Song; S. J. Cho; J. H. Boo

doi:10.4028/3-908451-18-3.151

Characterization of TiOxNy films grown by PECVD method: Structural and optical properties

C. K. Jung
, I. S. Bae
, Y. H. Song
, S. J. Cho
, J. H. Boo

Institute for Basic Science

Research output: Contribution to journal › Conference article › peer-review

5 Scopus citations

Abstract

Titanium oxynitride (TiOxNy) films were prepared by RF PECVD on Si(100) and glass substrates using nitrogen and argon mixture gas. Titanium iso-propoxide (Ti[OCH(CH₃)₂]₄, 97%) was used as precursor with different nitrogen flow rate to control oxygen and nitrogen contents in the films. Changes of chemical states of constituent elements in the deposited films were examined by X-ray photoelectron spectroscopy (XPS) analysis. With increasing nitrogen flow rate the total amount of nitrogen was increased while that of oxygen was decreased. The film growth orientation and N-H peak intensity characteristics were also analyzed by X-ray diffraction (XRD), atomic force microscopy (AFM), and infrared spectroscopy (FT-IR). Through refractive index as well as contact angle analysis, we can suggest that relationship to surface energy and optical property. Moreover, transmission electron microscopy (TEM) was also used to investigate the morphology of TiOxNy thin film and the phase of the TiOxNy thin film different nitrogen flow rate.

Original language	English
Pages (from-to)	151-154
Number of pages	4
Journal	Solid State Phenomena
Volume	111
DOIs	https://doi.org/10.4028/3-908451-18-3.151
State	Published - 2006
Externally published	Yes
Event	Symposium S Science and Technology of Hybrid Materials - ICMAT 2005: 3rd International Conference on Materials for Advanced Technologies; IUMRS-ICAM 2005: International Union of Materials Research Societies-9th International Conference on Advanced M - Singapore, Singapore Duration: 3 Jul 2005 → 8 Jul 2005

Keywords

Optical &structural properties
TEM analysis
TiOxNy thin films

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@article{6f1b788b1bd3499e9f4701c6b16036b1,

title = "Characterization of TiOxNy films grown by PECVD method: Structural and optical properties",

abstract = "Titanium oxynitride (TiOxNy) films were prepared by RF PECVD on Si(100) and glass substrates using nitrogen and argon mixture gas. Titanium iso-propoxide (Ti[OCH(CH3)2]4, 97\%) was used as precursor with different nitrogen flow rate to control oxygen and nitrogen contents in the films. Changes of chemical states of constituent elements in the deposited films were examined by X-ray photoelectron spectroscopy (XPS) analysis. With increasing nitrogen flow rate the total amount of nitrogen was increased while that of oxygen was decreased. The film growth orientation and N-H peak intensity characteristics were also analyzed by X-ray diffraction (XRD), atomic force microscopy (AFM), and infrared spectroscopy (FT-IR). Through refractive index as well as contact angle analysis, we can suggest that relationship to surface energy and optical property. Moreover, transmission electron microscopy (TEM) was also used to investigate the morphology of TiOxNy thin film and the phase of the TiOxNy thin film different nitrogen flow rate.",

keywords = "Optical \&structural properties, TEM analysis, TiOxNy thin films",

author = "Jung, \{C. K.\} and Bae, \{I. S.\} and Song, \{Y. H.\} and Cho, \{S. J.\} and Boo, \{J. H.\}",

year = "2006",

doi = "10.4028/3-908451-18-3.151",

language = "English",

volume = "111",

pages = "151--154",

journal = "Solid State Phenomena",

issn = "1012-0394",

publisher = "Trans Tech Publications Ltd",

note = "Symposium S Science and Technology of Hybrid Materials - ICMAT 2005: 3rd International Conference on Materials for Advanced Technologies; IUMRS-ICAM 2005: International Union of Materials Research Societies-9th International Conference on Advanced M ; Conference date: 03-07-2005 Through 08-07-2005",

}

TY - JOUR

T1 - Characterization of TiOxNy films grown by PECVD method

T2 - Symposium S Science and Technology of Hybrid Materials - ICMAT 2005: 3rd International Conference on Materials for Advanced Technologies; IUMRS-ICAM 2005: International Union of Materials Research Societies-9th International Conference on Advanced M

AU - Jung, C. K.

AU - Bae, I. S.

AU - Song, Y. H.

AU - Cho, S. J.

AU - Boo, J. H.

PY - 2006

Y1 - 2006

N2 - Titanium oxynitride (TiOxNy) films were prepared by RF PECVD on Si(100) and glass substrates using nitrogen and argon mixture gas. Titanium iso-propoxide (Ti[OCH(CH3)2]4, 97%) was used as precursor with different nitrogen flow rate to control oxygen and nitrogen contents in the films. Changes of chemical states of constituent elements in the deposited films were examined by X-ray photoelectron spectroscopy (XPS) analysis. With increasing nitrogen flow rate the total amount of nitrogen was increased while that of oxygen was decreased. The film growth orientation and N-H peak intensity characteristics were also analyzed by X-ray diffraction (XRD), atomic force microscopy (AFM), and infrared spectroscopy (FT-IR). Through refractive index as well as contact angle analysis, we can suggest that relationship to surface energy and optical property. Moreover, transmission electron microscopy (TEM) was also used to investigate the morphology of TiOxNy thin film and the phase of the TiOxNy thin film different nitrogen flow rate.

AB - Titanium oxynitride (TiOxNy) films were prepared by RF PECVD on Si(100) and glass substrates using nitrogen and argon mixture gas. Titanium iso-propoxide (Ti[OCH(CH3)2]4, 97%) was used as precursor with different nitrogen flow rate to control oxygen and nitrogen contents in the films. Changes of chemical states of constituent elements in the deposited films were examined by X-ray photoelectron spectroscopy (XPS) analysis. With increasing nitrogen flow rate the total amount of nitrogen was increased while that of oxygen was decreased. The film growth orientation and N-H peak intensity characteristics were also analyzed by X-ray diffraction (XRD), atomic force microscopy (AFM), and infrared spectroscopy (FT-IR). Through refractive index as well as contact angle analysis, we can suggest that relationship to surface energy and optical property. Moreover, transmission electron microscopy (TEM) was also used to investigate the morphology of TiOxNy thin film and the phase of the TiOxNy thin film different nitrogen flow rate.

KW - Optical &structural properties

KW - TEM analysis

KW - TiOxNy thin films

UR - https://www.scopus.com/pages/publications/35148896911

U2 - 10.4028/3-908451-18-3.151

DO - 10.4028/3-908451-18-3.151

M3 - Conference article

AN - SCOPUS:35148896911

SN - 1012-0394

VL - 111

SP - 151

EP - 154

JO - Solid State Phenomena

JF - Solid State Phenomena

Y2 - 3 July 2005 through 8 July 2005

ER -

Characterization of TiOxNy films grown by PECVD method: Structural and optical properties

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Keywords

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