Characterization of thermal annealing of gravure printed PVK/Ir(ppy) 3 organic light emitting layers

Hyemi Lee; Aran Kim; Sung Min Cho; Heeyeop Chae

doi:10.1016/j.cap.2010.08.029

Characterization of thermal annealing of gravure printed PVK/Ir(ppy) ₃ organic light emitting layers

Hyemi Lee, Aran Kim, Sung Min Cho, Heeyeop Chae

Department of Chemical Engineering

Sungkyunkwan University

Research output: Contribution to journal › Article › peer-review

7 Scopus citations

Abstract

We investigated gravure printing process as a promising large area and high throughput process for organic device fabrication. In this work, nanoscale organic light emitting PVK/Ir(ppy)₃ layers were formed using the gravure printing process to fabricate organic light emitting diodes (OLEDs), and roughness and morphology were controlled through thermal annealing processes. The fabricated OLED device had layer structure of glass/ITO/PEDOT:PSS/PVK + Ir(ppy)₃-active layer/LiF/Al. PVK(Poly (N-vinyl carbazole)) and Ir(ppy)₃ were used as the host and green-emitting dopant materials, respectively. The effect of thermal annealing process was investigated on surface roughness, morphology and crystallinity of the gravure printed organic layers. The optimum conditions were determined to be around 80 °C for the gravure printed organic layers for the given materials and device structure.

Original language	English
Pages (from-to)	e143-e146
Journal	Current Applied Physics
Volume	10
Issue number	4 SUPPL.
DOIs	https://doi.org/10.1016/j.cap.2010.08.029
State	Published - Nov 2010

Keywords

Gravure printing
Organic light emitting diode
Solvent effect

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10.1016/j.cap.2010.08.029

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@article{577b368746964762a660e0583f33675f,

title = "Characterization of thermal annealing of gravure printed PVK/Ir(ppy) 3 organic light emitting layers",

abstract = "We investigated gravure printing process as a promising large area and high throughput process for organic device fabrication. In this work, nanoscale organic light emitting PVK/Ir(ppy)3 layers were formed using the gravure printing process to fabricate organic light emitting diodes (OLEDs), and roughness and morphology were controlled through thermal annealing processes. The fabricated OLED device had layer structure of glass/ITO/PEDOT:PSS/PVK + Ir(ppy)3-active layer/LiF/Al. PVK(Poly (N-vinyl carbazole)) and Ir(ppy)3 were used as the host and green-emitting dopant materials, respectively. The effect of thermal annealing process was investigated on surface roughness, morphology and crystallinity of the gravure printed organic layers. The optimum conditions were determined to be around 80 °C for the gravure printed organic layers for the given materials and device structure.",

keywords = "Gravure printing, Organic light emitting diode, Solvent effect",

author = "Hyemi Lee and Aran Kim and Cho, \{Sung Min\} and Heeyeop Chae",

year = "2010",

month = nov,

doi = "10.1016/j.cap.2010.08.029",

language = "English",

volume = "10",

pages = "e143--e146",

journal = "Current Applied Physics",

issn = "1567-1739",

publisher = "Elsevier B.V.",

number = "4 SUPPL.",

}

TY - JOUR

T1 - Characterization of thermal annealing of gravure printed PVK/Ir(ppy) 3 organic light emitting layers

AU - Lee, Hyemi

AU - Kim, Aran

AU - Cho, Sung Min

AU - Chae, Heeyeop

PY - 2010/11

Y1 - 2010/11

N2 - We investigated gravure printing process as a promising large area and high throughput process for organic device fabrication. In this work, nanoscale organic light emitting PVK/Ir(ppy)3 layers were formed using the gravure printing process to fabricate organic light emitting diodes (OLEDs), and roughness and morphology were controlled through thermal annealing processes. The fabricated OLED device had layer structure of glass/ITO/PEDOT:PSS/PVK + Ir(ppy)3-active layer/LiF/Al. PVK(Poly (N-vinyl carbazole)) and Ir(ppy)3 were used as the host and green-emitting dopant materials, respectively. The effect of thermal annealing process was investigated on surface roughness, morphology and crystallinity of the gravure printed organic layers. The optimum conditions were determined to be around 80 °C for the gravure printed organic layers for the given materials and device structure.

AB - We investigated gravure printing process as a promising large area and high throughput process for organic device fabrication. In this work, nanoscale organic light emitting PVK/Ir(ppy)3 layers were formed using the gravure printing process to fabricate organic light emitting diodes (OLEDs), and roughness and morphology were controlled through thermal annealing processes. The fabricated OLED device had layer structure of glass/ITO/PEDOT:PSS/PVK + Ir(ppy)3-active layer/LiF/Al. PVK(Poly (N-vinyl carbazole)) and Ir(ppy)3 were used as the host and green-emitting dopant materials, respectively. The effect of thermal annealing process was investigated on surface roughness, morphology and crystallinity of the gravure printed organic layers. The optimum conditions were determined to be around 80 °C for the gravure printed organic layers for the given materials and device structure.

KW - Gravure printing

KW - Organic light emitting diode

KW - Solvent effect

UR - https://www.scopus.com/pages/publications/78449298134

U2 - 10.1016/j.cap.2010.08.029

DO - 10.1016/j.cap.2010.08.029

M3 - Article

AN - SCOPUS:78449298134

SN - 1567-1739

VL - 10

SP - e143-e146

JO - Current Applied Physics

JF - Current Applied Physics

IS - 4 SUPPL.

ER -

Characterization of thermal annealing of gravure printed PVK/Ir(ppy) ₃ organic light emitting layers

Abstract

Keywords

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