Abstract
Insertion of plasma-polymerized para-xylene (PPpX), formed by using plasma-enhanced chemical-vapor deposition (PECVD) under proper conditions, between the Al bottom cathode and the Alq 3 enhanced the performance of top-emission inverted organic light-emitting diodes (TEIOLED) with a glass/Al/Alq 3/TPD/ITO structure. The TEIOLED with PPpX deposited for 3 sec showed an external quantum efficiency about 3 times higher than without PPpX. X-ray photoelectron spectroscopy suggested the existence of PPpX between the Alq 3 emitting layer and the Al bottom cathode. The PPpX cathode interfacial layer is thought to contribute to the device's performance improvement by electron injection enhancement.
| Original language | English |
|---|---|
| Pages (from-to) | 1224-1227 |
| Number of pages | 4 |
| Journal | Journal of the Korean Physical Society |
| Volume | 46 |
| Issue number | 5 |
| State | Published - May 2005 |
Keywords
- Al bottom cathode
- Interfacial layer
- Plasma-polymerized para-xylene
- Top-emission inverted OLED