Characteristics of SiOxNy films deposited by inductively coupled plasma enhanced chemical vapor deposition using HMDS/NH3/O2/Ar for water vapor diffusion barrier

  • J. H. Lee
  • , C. H. Jeong
  • , H. B. Kim
  • , J. T. Lim
  • , S. J. Kyung
  • , G. Y. Yeom

Research output: Contribution to journal › Article › peer-review

15 Scopus citations

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