Characteristics of internal inductively coupled plasma source for ultralarge-area plasma processing

Jong Hyeuk Lim; Gwang Ho Gweon; Seung Pyo Hong; Kyong Nam Kim; Yi Yeon Kim; Geun Young Yeom

doi:10.1143/JJAP.49.030213

Characteristics of internal inductively coupled plasma source for ultralarge-area plasma processing

Jong Hyeuk Lim
, Gwang Ho Gweon
, Seung Pyo Hong
, Kyong Nam Kim
, Yi Yeon Kim
, Geun Young Yeom

Department of Advanced Materials Science and Engineering

Sungkyunkwan University

Research output: Contribution to journal › Article › peer-review

Abstract

The capacitive-inductive (E-H) mode transition characteristics of an ultralarge-area (2;750 × 2;350 mm²) inductively coupled plasma (ICP) system with multiple internal U-type antennas have been investigated. When the electrical characteristics of the ICP antenna such as power transfer efficiency and ICP source impedance, were measured as a function of ICP power, a distinctive change from E to H mode was identified at an rf power of approximately 3 kW. When the power transfer mode was changed from capacitive to inductive for the multiple U-type antenna configuration, better plasma uniformity was obtained owing to the more uniform power deposition along the antenna line.

Original language	English
Journal	Japanese Journal of Applied Physics
Volume	49
Issue number	3 PART 1
DOIs	https://doi.org/10.1143/JJAP.49.030213
State	Published - 2010

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@article{f2e4465993e442ea8c73935450a4bdc5,

title = "Characteristics of internal inductively coupled plasma source for ultralarge-area plasma processing",

abstract = "The capacitive-inductive (E-H) mode transition characteristics of an ultralarge-area (2;750 × 2;350 mm2) inductively coupled plasma (ICP) system with multiple internal U-type antennas have been investigated. When the electrical characteristics of the ICP antenna such as power transfer efficiency and ICP source impedance, were measured as a function of ICP power, a distinctive change from E to H mode was identified at an rf power of approximately 3 kW. When the power transfer mode was changed from capacitive to inductive for the multiple U-type antenna configuration, better plasma uniformity was obtained owing to the more uniform power deposition along the antenna line.",

author = "Lim, \{Jong Hyeuk\} and Gweon, \{Gwang Ho\} and Hong, \{Seung Pyo\} and Kim, \{Kyong Nam\} and Kim, \{Yi Yeon\} and Yeom, \{Geun Young\}",

year = "2010",

doi = "10.1143/JJAP.49.030213",

language = "English",

volume = "49",

journal = "Japanese Journal of Applied Physics",

issn = "0021-4922",

publisher = "Institute of Physics",

number = "3 PART 1",

}

TY - JOUR

T1 - Characteristics of internal inductively coupled plasma source for ultralarge-area plasma processing

AU - Lim, Jong Hyeuk

AU - Gweon, Gwang Ho

AU - Hong, Seung Pyo

AU - Kim, Kyong Nam

AU - Kim, Yi Yeon

AU - Yeom, Geun Young

PY - 2010

Y1 - 2010

N2 - The capacitive-inductive (E-H) mode transition characteristics of an ultralarge-area (2;750 × 2;350 mm2) inductively coupled plasma (ICP) system with multiple internal U-type antennas have been investigated. When the electrical characteristics of the ICP antenna such as power transfer efficiency and ICP source impedance, were measured as a function of ICP power, a distinctive change from E to H mode was identified at an rf power of approximately 3 kW. When the power transfer mode was changed from capacitive to inductive for the multiple U-type antenna configuration, better plasma uniformity was obtained owing to the more uniform power deposition along the antenna line.

AB - The capacitive-inductive (E-H) mode transition characteristics of an ultralarge-area (2;750 × 2;350 mm2) inductively coupled plasma (ICP) system with multiple internal U-type antennas have been investigated. When the electrical characteristics of the ICP antenna such as power transfer efficiency and ICP source impedance, were measured as a function of ICP power, a distinctive change from E to H mode was identified at an rf power of approximately 3 kW. When the power transfer mode was changed from capacitive to inductive for the multiple U-type antenna configuration, better plasma uniformity was obtained owing to the more uniform power deposition along the antenna line.

UR - https://www.scopus.com/pages/publications/77954012688

U2 - 10.1143/JJAP.49.030213

DO - 10.1143/JJAP.49.030213

M3 - Article

AN - SCOPUS:77954012688

SN - 0021-4922

VL - 49

JO - Japanese Journal of Applied Physics

JF - Japanese Journal of Applied Physics

IS - 3 PART 1

ER -

Characteristics of internal inductively coupled plasma source for ultralarge-area plasma processing

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