Characteristics of inductively coupled plasma with multiple U-type internal antenna for flat panel display applications

Kyong Nam Kim; Seung Jae Jung; Geun Young Yeom

doi:10.1016/j.surfcoat.2005.01.063

Characteristics of inductively coupled plasma with multiple U-type internal antenna for flat panel display applications

Kyong Nam Kim, Seung Jae Jung, Geun Young Yeom

Department of Advanced Materials Science and Engineering

Sungkyunkwan University

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

In this study, the characteristics of large area internal linear ICP sources of 1020 mm×920 mm (substrate area is 880 mm×660 mm) were investigated using two different types of antennas, that is, a conventional serpentine-type antenna and a newly developed multiple U-type antenna. The multiple U-type antenna showed higher plasma density, higher radical density, and more plasma stability compared to the serpentine-type antenna, and it appears from the higher inductive coupling and less standing wave effect compared to the serpentine-type antenna. Using the multiple U-type antenna, the plasma density of 2×10¹¹/cm³ with the plasma uniformity of 4% could be obtained using 15 mTorr Ar and 5000 W of RF power.

Original language	English
Pages (from-to)	784-787
Number of pages	4
Journal	Surface and Coatings Technology
Volume	200
Issue number	1-4 SPEC. ISS.
DOIs	https://doi.org/10.1016/j.surfcoat.2005.01.063
State	Published - 1 Oct 2005

Keywords

Display
Dry etching
Large area
Plasma

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10.1016/j.surfcoat.2005.01.063

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@article{43ed089bd7ad4bcdb026c3ac7a469671,

title = "Characteristics of inductively coupled plasma with multiple U-type internal antenna for flat panel display applications",

abstract = "In this study, the characteristics of large area internal linear ICP sources of 1020 mm×920 mm (substrate area is 880 mm×660 mm) were investigated using two different types of antennas, that is, a conventional serpentine-type antenna and a newly developed multiple U-type antenna. The multiple U-type antenna showed higher plasma density, higher radical density, and more plasma stability compared to the serpentine-type antenna, and it appears from the higher inductive coupling and less standing wave effect compared to the serpentine-type antenna. Using the multiple U-type antenna, the plasma density of 2×1011/cm3 with the plasma uniformity of 4\% could be obtained using 15 mTorr Ar and 5000 W of RF power.",

keywords = "Display, Dry etching, Large area, Plasma",

author = "Kim, \{Kyong Nam\} and Jung, \{Seung Jae\} and Yeom, \{Geun Young\}",

year = "2005",

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doi = "10.1016/j.surfcoat.2005.01.063",

language = "English",

volume = "200",

pages = "784--787",

journal = "Surface and Coatings Technology",

issn = "0257-8972",

publisher = "Elsevier B.V.",

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TY - JOUR

T1 - Characteristics of inductively coupled plasma with multiple U-type internal antenna for flat panel display applications

AU - Kim, Kyong Nam

AU - Jung, Seung Jae

AU - Yeom, Geun Young

PY - 2005/10/1

Y1 - 2005/10/1

N2 - In this study, the characteristics of large area internal linear ICP sources of 1020 mm×920 mm (substrate area is 880 mm×660 mm) were investigated using two different types of antennas, that is, a conventional serpentine-type antenna and a newly developed multiple U-type antenna. The multiple U-type antenna showed higher plasma density, higher radical density, and more plasma stability compared to the serpentine-type antenna, and it appears from the higher inductive coupling and less standing wave effect compared to the serpentine-type antenna. Using the multiple U-type antenna, the plasma density of 2×1011/cm3 with the plasma uniformity of 4% could be obtained using 15 mTorr Ar and 5000 W of RF power.

AB - In this study, the characteristics of large area internal linear ICP sources of 1020 mm×920 mm (substrate area is 880 mm×660 mm) were investigated using two different types of antennas, that is, a conventional serpentine-type antenna and a newly developed multiple U-type antenna. The multiple U-type antenna showed higher plasma density, higher radical density, and more plasma stability compared to the serpentine-type antenna, and it appears from the higher inductive coupling and less standing wave effect compared to the serpentine-type antenna. Using the multiple U-type antenna, the plasma density of 2×1011/cm3 with the plasma uniformity of 4% could be obtained using 15 mTorr Ar and 5000 W of RF power.

KW - Display

KW - Dry etching

KW - Large area

KW - Plasma

UR - https://www.scopus.com/pages/publications/24644507863

U2 - 10.1016/j.surfcoat.2005.01.063

DO - 10.1016/j.surfcoat.2005.01.063

M3 - Article

AN - SCOPUS:24644507863

SN - 0257-8972

VL - 200

SP - 784

EP - 787

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

IS - 1-4 SPEC. ISS.

ER -

Characteristics of inductively coupled plasma with multiple U-type internal antenna for flat panel display applications

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Keywords

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