Characteristics of inductively coupled plasma using internal double comb-type antenna for flat panel display processing

Jong Hyeuk Lim; Kyong Nam Kim; Jung Kyun Park; Jae Hun Park; Geun Young Yeom

doi:10.1143/JJAP.46.L1216

Characteristics of inductively coupled plasma using internal double comb-type antenna for flat panel display processing

Jong Hyeuk Lim
, Kyong Nam Kim
, Jung Kyun Park
, Jae Hun Park
, Geun Young Yeom

Department of Advanced Materials Science and Engineering

Sungkyunkwan University

Research output: Contribution to journal › Article › peer-review

1 Scopus citations

Abstract

This study examined the electrical and plasma properties of an internal linear inductive antenna for flat panel display processing. An internal linear antenna, which is referred to as a "double comb-type antenna", with a substrate area of 2,300 × 2,000 mm² was used as a large-area inductively coupled plasma (ICP) source. This extremely large area ICP source showed a transition from E-mode to H-mode near 3kW. At 9kW, a power transfer efficiency of approximately 81% was obtained. The plasma uniformity measured by a Langmuir probe was approximately 14% over the substrate area at 15 mTorr Ar and 5 kW of RF power.

Original language	English
Pages (from-to)	L1216-L1218
Journal	Japanese Journal of Applied Physics
Volume	46
Issue number	45-49
DOIs	https://doi.org/10.1143/JJAP.46.L1216
State	Published - 14 Dec 2007

Keywords

Flat panel display
Inductively coupled plasma
Large area plasma
Low impedance
Uniformity

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10.1143/JJAP.46.L1216

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@article{eb566a9f77754632ab8bcf4e5dfa3cdd,

title = "Characteristics of inductively coupled plasma using internal double comb-type antenna for flat panel display processing",

abstract = "This study examined the electrical and plasma properties of an internal linear inductive antenna for flat panel display processing. An internal linear antenna, which is referred to as a {"}double comb-type antenna{"}, with a substrate area of 2,300 × 2,000 mm2 was used as a large-area inductively coupled plasma (ICP) source. This extremely large area ICP source showed a transition from E-mode to H-mode near 3kW. At 9kW, a power transfer efficiency of approximately 81\% was obtained. The plasma uniformity measured by a Langmuir probe was approximately 14\% over the substrate area at 15 mTorr Ar and 5 kW of RF power.",

keywords = "Flat panel display, Inductively coupled plasma, Large area plasma, Low impedance, Uniformity",

author = "Lim, \{Jong Hyeuk\} and Kim, \{Kyong Nam\} and Park, \{Jung Kyun\} and Park, \{Jae Hun\} and Yeom, \{Geun Young\}",

year = "2007",

month = dec,

day = "14",

doi = "10.1143/JJAP.46.L1216",

language = "English",

volume = "46",

pages = "L1216--L1218",

journal = "Japanese Journal of Applied Physics",

issn = "0021-4922",

publisher = "Institute of Physics",

number = "45-49",

}

TY - JOUR

T1 - Characteristics of inductively coupled plasma using internal double comb-type antenna for flat panel display processing

AU - Lim, Jong Hyeuk

AU - Kim, Kyong Nam

AU - Park, Jung Kyun

AU - Park, Jae Hun

AU - Yeom, Geun Young

PY - 2007/12/14

Y1 - 2007/12/14

N2 - This study examined the electrical and plasma properties of an internal linear inductive antenna for flat panel display processing. An internal linear antenna, which is referred to as a "double comb-type antenna", with a substrate area of 2,300 × 2,000 mm2 was used as a large-area inductively coupled plasma (ICP) source. This extremely large area ICP source showed a transition from E-mode to H-mode near 3kW. At 9kW, a power transfer efficiency of approximately 81% was obtained. The plasma uniformity measured by a Langmuir probe was approximately 14% over the substrate area at 15 mTorr Ar and 5 kW of RF power.

AB - This study examined the electrical and plasma properties of an internal linear inductive antenna for flat panel display processing. An internal linear antenna, which is referred to as a "double comb-type antenna", with a substrate area of 2,300 × 2,000 mm2 was used as a large-area inductively coupled plasma (ICP) source. This extremely large area ICP source showed a transition from E-mode to H-mode near 3kW. At 9kW, a power transfer efficiency of approximately 81% was obtained. The plasma uniformity measured by a Langmuir probe was approximately 14% over the substrate area at 15 mTorr Ar and 5 kW of RF power.

KW - Flat panel display

KW - Inductively coupled plasma

KW - Large area plasma

KW - Low impedance

KW - Uniformity

UR - https://www.scopus.com/pages/publications/50849087861

U2 - 10.1143/JJAP.46.L1216

DO - 10.1143/JJAP.46.L1216

M3 - Article

AN - SCOPUS:50849087861

SN - 0021-4922

VL - 46

SP - L1216-L1218

JO - Japanese Journal of Applied Physics

JF - Japanese Journal of Applied Physics

IS - 45-49

ER -

Characteristics of inductively coupled plasma using internal double comb-type antenna for flat panel display processing

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Keywords

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