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Characteristics of inductively coupled plasma using internal double comb-type antenna for flat panel display processing

  • Jong Hyeuk Lim
  • , Kyong Nam Kim
  • , Jung Kyun Park
  • , Jae Hun Park
  • , Geun Young Yeom
  • Sungkyunkwan University

Research output: Contribution to journalArticlepeer-review

Abstract

This study examined the electrical and plasma properties of an internal linear inductive antenna for flat panel display processing. An internal linear antenna, which is referred to as a "double comb-type antenna", with a substrate area of 2,300 × 2,000 mm2 was used as a large-area inductively coupled plasma (ICP) source. This extremely large area ICP source showed a transition from E-mode to H-mode near 3kW. At 9kW, a power transfer efficiency of approximately 81% was obtained. The plasma uniformity measured by a Langmuir probe was approximately 14% over the substrate area at 15 mTorr Ar and 5 kW of RF power.

Original languageEnglish
Pages (from-to)L1216-L1218
JournalJapanese Journal of Applied Physics
Volume46
Issue number45-49
DOIs
StatePublished - 14 Dec 2007

Keywords

  • Flat panel display
  • Inductively coupled plasma
  • Large area plasma
  • Low impedance
  • Uniformity

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