Characteristics of high aspect ratio SiO2 etching using C4H2F6 isomers

  • Hye Joo Lee
  • , Hyun Woo Tak
  • , Seong Bae Kim
  • , Seul Ki Kim
  • , Tae Hyun Park
  • , Ji Yeun Kim
  • , Dain Sung
  • , Wonseok Lee
  • , Seung Bae Lee
  • , Keunsuk Kim
  • , Byeong Ok Cho
  • , Young Lea Kim
  • , Ki Chan Lee
  • , Dong Woo Kim
  • , Geun Young Yeom

Research output: Contribution to journal › Article › peer-review

23   Link opens in a new tab Scopus citations

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