Abstract
Carbon nanotubes (CNT) were grown in He/C2H2/NH 3 by atmospheric pressure plasma enhanced chemical vapor deposition (AP-PECVD) using a multi-pin-to-plate type discharge system at low temperature. FT-Raman data was also presented for the growth temperature of 450 and 500°C and for the NH3 flow rate of 210 and 270 sccm. It showed the decrease of defective carbon (ID)/graphite carbon (IG to 0.772 with increasing substrate temperature and NH3 showed the improved quality of grown CNT. The field emission field at 1 mA/cm2 was 5.25 V/μm, when the field emission properties were measured for CNT at 500°C for 3 min.
| Original language | English |
|---|---|
| Pages (from-to) | 807-809 |
| Number of pages | 3 |
| Journal | Carbon |
| Volume | 44 |
| Issue number | 4 |
| DOIs | |
| State | Published - Apr 2006 |
Keywords
- Carbon nanotubes
- Field emission
- High pressure
- Scanning electron microscopy
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