Abstract
In(Ga)N/GaN multiple quantum well structures with high indium composition were grown using pure InN in well layers by low-pressure metalorganic chemical vapor deposition. Blue emission using a thin In(Ga)N well width grown with only trimethylindium as a III-source showed strong carrier localization originating from a large fluctuation in indium composition and a reduced quantum-confined Stark effect due to the use of a thin well, both of which enhanced quantum efficiency. In contrast, an increase in InN growth time to achieve green emission exhibited a large blueshift of electroluminescent emission under forward-bias current and microstructural defect formation, which were responsible for the observed degradation in emission properties.
| Original language | English |
|---|---|
| Pages (from-to) | 282-287 |
| Number of pages | 6 |
| Journal | Journal of Crystal Growth |
| Volume | 299 |
| Issue number | 2 |
| DOIs | |
| State | Published - 15 Feb 2007 |
Keywords
- A1. Characterization
- A3. Metalorganic chemical vapor deposition
- B1. Nitrides
- B2. Semiconducting III-V materials