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Author Correction: Direct growth of orthorhombic Hf0.5Zr0.5O2 thin films for hysteresis-free MoS2 negative capacitance field-effect transistors (npj 2D Materials and Applications, (2021), 5, 1, (46), 10.1038/s41699-021-00229-w)

  • Hae Won Cho
  • , Pavan Pujar
  • , Minsu Choi
  • , Seunghun Kang
  • , Seongin Hong
  • , Junwoo Park
  • , Seungho Baek
  • , Yunseok Kim
  • , Jaichan Lee
  • , Sunkook Kim
  • Sungkyunkwan University

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