Atomic layer deposited Al2O3 for gate dielectric and passivation layer of single-walled carbon nanotube transistors
- S. K. Kim
- , Y. Xuan
- , P. D. Ye
- , S. Mohammadi
- , J. H. Back
- , Moonsub Shim
- Purdue University
- University of Illinois at Urbana-Champaign
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