At speed HTOL test for reliability qualification of high speed mobile applications

  • Jongwoo Park
  • , Ahn Da
  • , Donghee Lee
  • , E. S. Jang
  • , Wooyeon Kim
  • , Sangchul Shin
  • , Gunrae Kim
  • , Nae In Lee
  • , Sangwoo Pae

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

4 Scopus citations

Abstract

In this paper, intuition is given on the Vmin shift behaviors under high speed frequency high temperature operating life (HTOL) stress conditions on Dual- and Quad-Core Application Processors (AP) fabricated with advanced High-k/Metal-gate (HK/MG) process. Unlike a constant frequency at 1 MHz, At Speed HTOL (ASH) stress tests over 1.5 GHz enables pragmatic Vmin trends. ASH Vmin results represent more realistic Vmin-shift from the viewpoint of both reliability stress and prediction of field EOL. We'll discuss Vmin shift results on ASH and its perspective as the current and future qualification tool for high speed mobile applications.

Original languageEnglish
Title of host publication2013 IEEE International Reliability Physics Symposium, IRPS 2013
Pages3E.2.1-3E.2.4
DOIs
StatePublished - 2013
Externally publishedYes
Event2013 IEEE International Reliability Physics Symposium, IRPS 2013 - Monterey, CA, United States
Duration: 14 Apr 201318 Apr 2013

Publication series

NameIEEE International Reliability Physics Symposium Proceedings
ISSN (Print)1541-7026

Conference

Conference2013 IEEE International Reliability Physics Symposium, IRPS 2013
Country/TerritoryUnited States
CityMonterey, CA
Period14/04/1318/04/13

Keywords

  • application processor
  • at speed HTOL
  • High-k
  • reliability qualification
  • Vmin

Fingerprint

Dive into the research topics of 'At speed HTOL test for reliability qualification of high speed mobile applications'. Together they form a unique fingerprint.

Cite this