Asymmetrical single-mode silica waveguide deposited by PECVD

Silicon oxynitride (SiON) layer and SiO₂ buffer layer were deposited on silicon wafers by PECVD technique using SiH₄, N ₂O and N₂. The refractive index of SiON films measured at a wavelength of 1552 nm using a prism coupler, could be continuously varied from 1.4480 to 1.4508. Optical planar waveguides with a thickness of 6 μm and a refractive index contrast (Δn) of 0.36% have been obtained. In addition, etching experiments were performed using ICP dry etching equipment on thick SiON films grown on Si substrates covered with a thick SiO₂ buffer layer. In order to measure optical properties, a polarization maintaining single-mode fiber was used for the input and a microscope objective for the output at 1.55 μ m. A low-loss and low propagation SiON-based waveguide was fabricated with easily adjustable refractive index of core layer.