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Angular dependences of SiO 2 etch rates in C 4F 6/O 2/Ar and C 4F 6/CH 2F 2/O 2/Ar plasmas

  • Sung Woon Cho
  • , Chang Koo Kim
  • , Jin Kwan Lee
  • , Sang Heup Moon
  • , Heeyeop Chae
  • Ajou University
  • Seoul National University
  • Samsung

Research output: Contribution to journal › Article › peer-review

25   Link opens in a new tab Scopus citations

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