An in-situ FTIR study on palladium displacement reaction for autocatalytic electroless copper deposition

Youn Jin Oh; Chan Hwa Chung

An in-situ FTIR study on palladium displacement reaction for autocatalytic electroless copper deposition

Youn Jin Oh, Chan Hwa Chung

Department of Chemical Engineering

Sungkyunkwan University

Research output: Contribution to conference › Paper › peer-review

Abstract

We have investigated on the mechanism of palladium autocatalytic displacement reaction on the Si substrate in PdCl₂-HCl-HF-NH ₄OH bath, which occurs to the Pd activation step in electroless Cu deposition process. It has been monitored that Pd(NH₃) ₄Cl₂ in the electrolyte is reduced to Pd particles by displacement reaction with substrate silicon and NH₄⁺ complex are generated during the Pd activatioa In the in-situ FTIR analysis, N-H vibration peaks in Pd(NH₃)₄Cl₂ of electrolyte are shifted to N-H peaks in NH₄⁺ complex. The IR peaks of SiF₆^2-and N-H bonds of NH₄ ⁺ are also evident during the Pd activation on the Si surface. It reveals that palladium in Pd(NH₃)₄Cl₂ has been reduced to metallic Pd particles on Si substrate and (NH₄) ₂SiF₆ compound has been produced.

Original language	English
Pages	79-87
Number of pages	9
State	Published - 2003
Event	Copper Interconnects, New Contact Metallurgies/Structures, and Low-k Interlevel Dielectrics II - Proceedings of the International Symposium - Orlando, FL, United States Duration: 12 Oct 2003 → 17 Oct 2003

Conference

Conference	Copper Interconnects, New Contact Metallurgies/Structures, and Low-k Interlevel Dielectrics II - Proceedings of the International Symposium
Country/Territory	United States
City	Orlando, FL
Period	12/10/03 → 17/10/03

Cite this

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title = "An in-situ FTIR study on palladium displacement reaction for autocatalytic electroless copper deposition",

abstract = "We have investigated on the mechanism of palladium autocatalytic displacement reaction on the Si substrate in PdCl2-HCl-HF-NH 4OH bath, which occurs to the Pd activation step in electroless Cu deposition process. It has been monitored that Pd(NH3) 4Cl2 in the electrolyte is reduced to Pd particles by displacement reaction with substrate silicon and NH4+ complex are generated during the Pd activatioa In the in-situ FTIR analysis, N-H vibration peaks in Pd(NH3)4Cl2 of electrolyte are shifted to N-H peaks in NH4+ complex. The IR peaks of SiF62-and N-H bonds of NH4 + are also evident during the Pd activation on the Si surface. It reveals that palladium in Pd(NH3)4Cl2 has been reduced to metallic Pd particles on Si substrate and (NH4) 2SiF6 compound has been produced.",

author = "Oh, \{Youn Jin\} and Chung, \{Chan Hwa\}",

year = "2003",

language = "English",

pages = "79--87",

note = "Copper Interconnects, New Contact Metallurgies/Structures, and Low-k Interlevel Dielectrics II - Proceedings of the International Symposium ; Conference date: 12-10-2003 Through 17-10-2003",

}

An in-situ FTIR study on palladium displacement reaction for autocatalytic electroless copper deposition. / Oh, Youn Jin; Chung, Chan Hwa.
2003. 79-87 Paper presented at Copper Interconnects, New Contact Metallurgies/Structures, and Low-k Interlevel Dielectrics II - Proceedings of the International Symposium, Orlando, FL, United States.

Research output: Contribution to conference › Paper › peer-review

TY - CONF

T1 - An in-situ FTIR study on palladium displacement reaction for autocatalytic electroless copper deposition

AU - Oh, Youn Jin

AU - Chung, Chan Hwa

PY - 2003

Y1 - 2003

N2 - We have investigated on the mechanism of palladium autocatalytic displacement reaction on the Si substrate in PdCl2-HCl-HF-NH 4OH bath, which occurs to the Pd activation step in electroless Cu deposition process. It has been monitored that Pd(NH3) 4Cl2 in the electrolyte is reduced to Pd particles by displacement reaction with substrate silicon and NH4+ complex are generated during the Pd activatioa In the in-situ FTIR analysis, N-H vibration peaks in Pd(NH3)4Cl2 of electrolyte are shifted to N-H peaks in NH4+ complex. The IR peaks of SiF62-and N-H bonds of NH4 + are also evident during the Pd activation on the Si surface. It reveals that palladium in Pd(NH3)4Cl2 has been reduced to metallic Pd particles on Si substrate and (NH4) 2SiF6 compound has been produced.

AB - We have investigated on the mechanism of palladium autocatalytic displacement reaction on the Si substrate in PdCl2-HCl-HF-NH 4OH bath, which occurs to the Pd activation step in electroless Cu deposition process. It has been monitored that Pd(NH3) 4Cl2 in the electrolyte is reduced to Pd particles by displacement reaction with substrate silicon and NH4+ complex are generated during the Pd activatioa In the in-situ FTIR analysis, N-H vibration peaks in Pd(NH3)4Cl2 of electrolyte are shifted to N-H peaks in NH4+ complex. The IR peaks of SiF62-and N-H bonds of NH4 + are also evident during the Pd activation on the Si surface. It reveals that palladium in Pd(NH3)4Cl2 has been reduced to metallic Pd particles on Si substrate and (NH4) 2SiF6 compound has been produced.

UR - https://www.scopus.com/pages/publications/5744240642

M3 - Paper

AN - SCOPUS:5744240642

SP - 79

EP - 87

T2 - Copper Interconnects, New Contact Metallurgies/Structures, and Low-k Interlevel Dielectrics II - Proceedings of the International Symposium

Y2 - 12 October 2003 through 17 October 2003

ER -

An in-situ FTIR study on palladium displacement reaction for autocatalytic electroless copper deposition

Abstract

Conference

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