Amidoxime-Containing Zr and Hf Atomic Layer Deposition Precursors for Metal Oxide Thin Films
- Ga Yeon Lee
- , Seung Hun Lee
- , In Ho Jo
- , Chan Mi Cho
- , Svetlana Shostak
- , Ji Yeon Ryu
- , Bo Keun Park
- , Seung Uk Son
- , Cheol Ho Choi
- , Taeyong Eom
- , Jeong Hwan Kim
- , Taek Mo Chung
- Korea Research Institute of Chemical Technology
- Hanbat National University
- Kyungpook National University
- University of Science and Technology UST
Research output: Contribution to journal › Article › peer-review
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