Admittance spectroscopic analysis of organic light emitting diodes with the CF_X plasma treatment on the surface of indium tin oxide anodes

Admittance spectroscopic analysis was used to examine the effect of a CF_X plasma surface treatment on indium tin oxide (ITO) anodes using CF₄ gas and model the equivalent circuit for organic light emitting diodes (OLEDs) with the of ITO anode surface treated with CF_X plasma. This device with the ITO/N,N′-diphenyl-N,N′-bis(3-methylphenyl)-1,1′-diphenyl-4,4′-diamine/tris-(8-hydroxyquinoline) aluminum/lithium fluoride/Al structure was modeled as a simple combination of two resistors and a capacitor. The ITO anode surface treated with the CF_X plasma showed a shift in the vacuum level of the ITO, which resulted in a decrease in the barrier height for hole injection at the ITO/organic interface. Admittance spectroscopy measurements of the devices with the CF_X plasma treatment on the surface of the ITO anodes showed a change in the contact resistance, bulk resistance and bulk capacitance.