A Study of Spin coated a-IGZO TFT with Y-doped ZrO2 Gate Insulators

  • Eun Kyung Jo
  • , Jeong Hyun Ahn
  • , Tae Eun Ha
  • , Eunho Kim
  • , Hwarim Im
  • , Yong Sang Kim

Research output: Contribution to journalConference articlepeer-review

1 Scopus citations

Abstract

In this study, an indium gallium zinc oxide (IGZO) thin-film transistor (TFT) based on Yttrium-doped ZrO2 dielectric was studied. We revealed that a-IGZO/1:8 Y-doped ZrO2 TFT deteriorated compared to a-IGZO/ZrO2 TFT. On the other hand, a-IGZO/1:2 Y-doped ZrO2 TFT had better overall properties than a-IGZO/ ZrO2 TFT.

Original languageEnglish
Pages (from-to)354-357
Number of pages4
JournalProceedings of the International Display Workshops
Volume29
StatePublished - 2022
Externally publishedYes
Event29th International Display Workshops, IDW 2022 - Fukuoka, Japan
Duration: 14 Dec 202216 Dec 2022

Keywords

  • a-IGZO TFT
  • High-k
  • Solution Process
  • Y-doped ZrO2

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