A Process-Aware Analytical Gate Resistance Model for Nanosheet Field-Effect Transistors

  • Junha Suk
  • , Yohan Kim
  • , Jungho Do
  • , Garoom Kim
  • , Woojin Rim
  • , Sanghoon Baek
  • , Seiseung Yoon
  • , Soyoung Kim

Research output: Contribution to journal › Article › peer-review

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