A-IGZO TFT fabrication using advanced imprint lithography

Hee Nam Chae, Sung Jin Kim, Jae Wan Cho, Sung Min Cho

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

The imprint lithography has advantage of decreased process step. This study aims to fabricate a-IGZO TFT of bottom gate-type using the advanced imprint lithography. Before the imprinting, layers were deposited on the substrate. The surface was coated with resin to make pattern. Multi-layers were dry etched using the process gas.

Original languageEnglish
Title of host publication25th International Display Workshops, IDW 2018
PublisherInternational Display Workshops
Pages349-352
Number of pages4
ISBN (Electronic)9781510883918
StatePublished - 2018
Event25th International Display Workshops, IDW 2018 - Nagoya, Japan
Duration: 12 Dec 201814 Dec 2018

Publication series

NameProceedings of the International Display Workshops
Volume1
ISSN (Print)1883-2490

Conference

Conference25th International Display Workshops, IDW 2018
Country/TerritoryJapan
CityNagoya
Period12/12/1814/12/18

Keywords

  • A-IGZO TFT
  • Imprint lithography
  • Rollable OLED

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