A 130 nm InP HBT integrated circuit technology for THz electronics

  • M. Urteaga
  • , J. Hacker
  • , Z. Griffith
  • , A. Young
  • , R. Pierson
  • , P. Rowell
  • , M. Seo
  • , M. J.W. Rodwell

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

A 130 nm InP HBT IC technology has been developed capable of circuit demonstrations at > 600 GHz. Transistors demonstrate RF figures-of-merit ft > 500 GHz and fmax > 1 THz. The HBTs support high current densities > 25 mA/μm2 with a common-emitter breakdown voltage BVceo = 3.5 V. The technology includes a multi-level thin-film wiring environment capable of low-loss THz signal routing and high integration density. A large-signal HBT model has been developed capable of accurately predicting circuit performance at THz frequencies. Circuit demonstrations include fundamental oscillators and amplifiers operating at > 600 GHz as well as integrated transmitter and receiver circuits.

Original languageEnglish
Title of host publication2016 IEEE International Electron Devices Meeting, IEDM 2016
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages29.2.1-29.2.4
ISBN (Electronic)9781509039012
DOIs
StatePublished - 31 Jan 2017
Event62nd IEEE International Electron Devices Meeting, IEDM 2016 - San Francisco, United States
Duration: 3 Dec 20167 Dec 2016

Publication series

NameTechnical Digest - International Electron Devices Meeting, IEDM
ISSN (Print)0163-1918

Conference

Conference62nd IEEE International Electron Devices Meeting, IEDM 2016
Country/TerritoryUnited States
CitySan Francisco
Period3/12/167/12/16

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