Focused Ion Beam 4

This fully digital Field Emission Scanning Electron Microscope (FE-SEM) is integrated with advanced Focused Ion Beam (FIB) technology, enabling rapid nanometer-scale characterization in 2D and 3D, high-quality thin sample preparation, and in-situ materials testing. The system features Electron Beam Deceleration, allowing ultra-low landing energies (down to 20 V), improved low-kV imaging, and optimized contrast for both topography and material composition. A motorized Eucentric or Piezo goniometer stage with integrated tools for in-situ manipulation and TEM lamella transfer enhances user control and precision. A built-in plasma cleaner ensures clean surfaces, which is critical for low-energy imaging and accurate material analysis.