Focused Ion Beam 2

  • Wonsang Shin (Manager)

Equipment/facility: Equipment

    Equipments Details

    Description

    This system utilizes a Ga liquid metal ion source and supports accelerating voltages from 1 to 30 kV in 5 kV steps, achieving a high image resolution of 5 nm at 30 kV and a beam current of up to 60 nA. The integrated low-vacuum mode allows for SEM observation of insulating materials without the need for coating, enabling wide applicability across various research fields. The FIB function supports fine milling and TEM thin-film sample preparation, making it ideal for micro/nanoscale structural analysis. In addition, the system enables 3D image reconstruction, offering deeper insight into the internal structures of specimens.

    Details

    NameFIB 2
    Acquisition date1/05/13
    ManufacturersJEOL

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